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Preface

Ian McNulty

AIP Conf. Proc. 1365, pp. 1-2; doi:http://dx.doi.org/10.1063/1.3628768 (2 pages)

Online Publication Date: 16 September 2011

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07.85.Tt	X-ray microscopes
68.37.Yz	X-ray microscopy
78.70.En	X-ray emission spectra and fluorescence

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Development of an Adaptive Optical System for Sub‐10‐nm Focusing of Synchrotron Radiation Hard X‐rays

H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, K. Tamasaku, Y. Koumura, M. Yabashi, T. Ishikawa, and K. Yamauchi

AIP Conf. Proc. 1365, pp. 13-17; doi:http://dx.doi.org/10.1063/1.3625294 (5 pages)

Online Publication Date: 16 September 2011

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In the hard x‐ray region, to obtain the theoretical resolution or diffraction‐limited focusing size in an imaging optical system, both ultraprecise optics and highly accurate alignment are necessary. An adaptive optical system is used for the compensation of aberrations in various optical systems, such as optical microscopes and space telescopes. In situ wavefront control of hard x‐rays is also effective for realizing ideal performance. The aim of this paper is to develop an adaptive optical system for sub‐10‐nm hard x‐ray focusing. The adaptive optical system performs the wavefront measurement using a phase retrieval algorithm and wavefront control using grazing‐incidence deformable mirrors. Several results of experiments using the developed system are reported.

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52.59.Px	Hard X-ray sources
42.15.Eq	Optical system design
42.68.Kh	Effects of air pollution
42.15.Fr	Aberrations

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Towards 10‐nm Soft X‐Ray Zone Plate Fabrication

A. Holmberg, J. Reinspach, M. Lindblom, E. Chubarova, M. Bertilson, O. von Hofsten, D. Nilsson, M. Selin, D. Larsson, P. Skoglund, U. Lundström, P. Takman, U. Vogt, and H. M. Hertz

AIP Conf. Proc. 1365, pp. 18-23; doi:http://dx.doi.org/10.1063/1.3625295 (6 pages)

Online Publication Date: 16 September 2011

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In this paper the latest efforts to improve our nanofabrication process for soft x‐ray zone plates is presented. The resolving power, which is proportional to the smallest outermost zone width of the zone plate, is increased by introducing cold development of the electron beam resist that is used for the patterning. With this process we have fabricated Ni zone plates with 13‐nm outermost zone and shown potential for making 11‐nm half‐pitch lines in the electron beam resist. Maintaining the diffraction efficiency of the zone plate is a great concern when the outermost zone width is decreased. To resolve this problem we have developed the so‐called Ni‐Ge zone plate in which the zone plate is build up by Ni and Ge, resulting in an increase of the diffraction efficiency. In a proof‐of‐principle experiment with 25‐nm Ni‐Ge zone plates, we have shown a doubling of the diffraction efficiency. When combined with cold development, the Ni‐Ge process has been shown to work down to 16‐nm half‐pitch. It is plausible that further refinement of the process will make it possible to go to 10‐nm outermost zone widths.

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85.40.Hp	Lithography, masks and pattern transfer
61.05.cp	X-ray diffraction
81.15.Pq	Electrodeposition, electroplating
42.79.Ci	Filters, zone plates, and polarizers
81.16.Nd	Micro- and nanolithography

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Development of Multilayer Laue Lenses; (1) Linear Type

T. Koyama, H. Takenaka, S. Ichimaru, T. Ohchi, T. Tsuji, H. Takano, and Y. Kagoshima

AIP Conf. Proc. 1365, pp. 24-27; doi:http://dx.doi.org/10.1063/1.3625296 (4 pages) | Cited 2 times

Online Publication Date: 16 September 2011

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A multilayer Laue lens (MLL) made from MoSi₂/Si has been fabricated aiming at a sub‐10‐nm spatial resolution for hard x‐ray microscopy. A multilayer of 1000 alternating MoSi₂ and Si layers with a layer thickness gradually increasing from 5 nm to 316 nm according to the Fresnel lens structure was deposited on a silicon substrate using DC magnetron sputtering, and then the substrate was diced, polished and thinned. The multilayer total thickness was about 10 μm. Optical properties were measured at the SPring‐8 beamline BL24XU using 20‐keV x‐rays. While observing changes in far‐field diffraction patterns by changing the tilt angle of the MLL, a dynamical diffraction effect of the MLL was visually confirmed. The achieved line focusing size was 13.1 nm, which is the best ever reported by using an MLL. The maximum local diffraction efficiency was measured to be 62%. Further, two MLLs were arranged in the KB configuration and applied to scanning transmission microscopy.

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78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
68.37.Yz	X-ray microscopy
61.05.cp	X-ray diffraction
68.37.Lp	Transmission electron microscopy (TEM)

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X‐ray Grating Interferometry at ESRF: Applications and Recent Technical Developments

T. Weitkamp, I. Zanette, G. Schulz, M. Bech, S. Rutishauser, S. Lang, T. Donath, A. Tapfer, H. Deyhle, P. Bernard, J.‐P. Valade, E. Reznikova, J. Kenntner, J. Mohr, B. Müller, et al.

AIP Conf. Proc. 1365, pp. 28-31; doi:http://dx.doi.org/10.1063/1.3625297 (4 pages)

Online Publication Date: 16 September 2011

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We report on the implementation of X‐ray grating interferometry at the imaging beamline ID19 of the European Synchrotron Radiation Facility (ESRF). We give a brief overview of the results obtained so far with this instrument and on ongoing developments.

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42.79.Dj	Gratings
42.87.Bg	Phase shifting interferometry
07.60.Ly	Interferometers
87.59.Dj	Angiography

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Soft X‐Ray Microscopy at HZB: Zone Plate Development and Imaging Using the Third Order of Diffraction

S. Rehbein, P. Guttmann, S. Werner, and G. Schneider

AIP Conf. Proc. 1365, pp. 32-37; doi:http://dx.doi.org/10.1063/1.3625298 (6 pages)

Online Publication Date: 16 September 2011

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The Helmholtz‐Zentrum Berlin (HZB) operates a transmission x‐ray microscope (TXM) in the soft x‐ray photon energy range with an energy resolution up to E/ΔE = 10⁴ [1]. An approach to achieve ultrahigh spatial resolution with conventional, standard zone plate optics is to employ higher orders of diffraction of the zone plate objective [2]. In this paper, we demonstrate that 11‐nm lines and spaces of a multilayer test structure are clearly resolved by the x‐ray microscope using the third order of diffraction of a zone plate objective with 20‐nm outermost zone width. The disadvantage of high‐order imaging is an about one order of magnitude lower diffraction efficiency of the used zone plates employed in the third order compared to the first order of diffraction. In addition, the measured background signal in the TXM images is no longer negligible. Therefore, we worked on the fabrication of zone plates with sub‐20‐nm outermost zone width to increase the spatial resolution in the first order of diffraction. A new high‐resolution 100‐keV e‐beam lithography system from VISTEC, which was recently installed at the Helmholtz‐Zentrum Berlin, makes these developments possible. Initial results on zone plates with an outermost zone width down to 15 nm exposed with the new e‐beam system are presented. Furthermore, the contrast transfer function of the transmission x‐ray microscope operating in partial coherence mode is measured by using the first and third diffraction order of the zone plate objective.

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61.05.cp	X-ray diffraction
78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
41.50.+h	X-ray beams and x-ray optics
42.30.Wb	Image reconstruction; tomography
42.30.Sy	Pattern recognition

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Following Dynamic Processes by X‐ray Tomographic Microscopy with Sub‐second Temporal Resolution

R. Mokso, F. Marone, D. Haberthür, J. C. Schittny, G. Mikuljan, A. Isenegger, and M. Stampanoni

AIP Conf. Proc. 1365, pp. 38-41; doi:http://dx.doi.org/10.1063/1.3625299 (4 pages)

Online Publication Date: 16 September 2011

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Several non‐destructive imaging techniques offer the possibility to observe rapid phenomena in real time, yet most of these techniques fail when it comes to bulky samples and micrometer precision in three dimensions. Therefore there is clearly a need to develop approaches that address such conditions. We identified the large potential that lies in synchrotron‐based x‐rays as a probe and developed a direct‐space tomographic instrument suitable to provide sub‐second temporal resolution with several‐micrometers spatial resolution. Selected applications from the field of biology and material science are shown in order to demonstrate the unique capabilities in generating three‐dimensional images with very high quality making image segmentation and analysis possible for samples that could, until now, only be studied in two dimensions due to the occurrence of rapid structural changes.

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42.30.Wb	Image reconstruction; tomography
52.59.Px	Hard X-ray sources
41.85.Si	Particle beam collimators, monochromators
78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
41.50.+h	X-ray beams and x-ray optics

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Imaging of Nanocrystals with Atomic Resolution Using High‐Energy Coherent X‐rays

J. Gulden, O. M. Yefanov, E. Weckert, and I. A. Vartanyants

AIP Conf. Proc. 1365, pp. 42-45; doi:http://dx.doi.org/10.1063/1.3625300 (4 pages)

Online Publication Date: 16 September 2011

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Coherent x‐ray diffractive imaging is applied to investigate the structure of nanoislands with atomic resolution. We propose to use high‐energy coherent x‐rays to achieve this goal. We present here results of simulations performed on Pd nanocrystals from 2 nm to 20 nm in size illuminated by high‐energy x‐rays from 20 keV to 100 keV. Experimental conditions with different incoming photon flux were also analyzed.

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61.05.cp	X-ray diffraction
61.05.cf	X-ray scattering (including small-angle scattering)
78.67.Bf	Nanocrystals, nanoparticles, and nanoclusters
68.37.Lp	Transmission electron microscopy (TEM)

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Multilayer‐Based Optics for High‐Brightness X‐ray Sources

S. Bajt, H. N. Chapman, J. Krzywinski, A. J. Nelson, A. Aquila, and M. Barthelmess

AIP Conf. Proc. 1365, pp. 46-51; doi:http://dx.doi.org/10.1063/1.3625301 (6 pages)

Online Publication Date: 16 September 2011

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High‐brightness x‐ray sources, such as next‐generation synchrotrons and free‐electron lasers (FELs), pose unique challenges for the development of x‐ray optics. The peak intensities of FEL pulses can be high enough to convert any material placed in a focused beam into plasma. X‐ray optics, which are used close to the focal spot, are likely to be partially or completely damaged in a single shot. Such optics would need to be replenished after each shot. Optics that are used in the unfocused or indirect beam may survive much longer, perhaps indefinitely, if care is used to limit the energy absorbed in the optics. Here we present different types of multilayer‐based optics, which were used successfully in FEL experiments for reflecting, focusing, and filtering high‐intensity, pulsed x‐rays in a variety of novel science applications.

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78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
41.50.+h	X-ray beams and x-ray optics
41.60.Cr	Free-electron lasers
61.05.cp	X-ray diffraction

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X‐ray Microscopy Beamlines at SSRF—Present Status and Future Plan

H. Xu, X. Yu, and R. Tai

AIP Conf. Proc. 1365, pp. 52-56; doi:http://dx.doi.org/10.1063/1.3625302 (5 pages)

Online Publication Date: 16 September 2011

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The Shanghai Synchrotron Radiation Facility (SSRF) is a 3.5‐GeV third‐generation light source. The facility has been open for user experiments since May, 2009. This high‐brightness x‐ray source is an ideal platform for x‐ray microscopy. Presently, SSRF has three beamlines related to x‐ray microscopy or imaging, namely the soft x‐ray spectromicroscopy beamline (STXM), the hard x‐ray microfocusing beamline, and the x‐ray imaging beamline. The construction of SSRF phase‐II beamlines will be carried out during 2011‐2017. Seven additional beamlines for x‐ray microscopy or imaging will be built.

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41.50.+h	X-ray beams and x-ray optics
87.59.cf	Digital fluoroscopy
87.57.nf	Reconstruction
41.85.Si	Particle beam collimators, monochromators

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The Scanning Nanoprobe Beamline Nanoscopium at Synchrotron Soleil

A. Somogyi, C. M. Kewish, F. Polack, and T. Moreno

AIP Conf. Proc. 1365, pp. 57-60; doi:http://dx.doi.org/10.1063/1.3625303 (4 pages)

Online Publication Date: 16 September 2011

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The Nanoscopium beamline at Synchrotron Soleil will offer advanced scanning‐based hard x‐ray imaging techniques in the 5‐ to 20‐keV energy range, for user communities working in the earth, environmental, and life sciences. Two dedicated end stations will exploit x‐ray coherence to produce images in which contrast is based on a range of physical processes. In the first experiment hutch, coherent scatter imaging techniques will produce images in which contrast arises from spatial variations in the complex refractive index, and orientation in the nanostructure of samples. In the second experiment hutch, elemental mapping will be carried out at the trace (ppm) level by scanning x‐ray fluorescence, speciation mapping by XANES, and phase gradient mapping by scanning differential phase contrast imaging. The beamline aims to reach sub‐micrometric, down to 30 nm, spatial resolution.

This ∼155‐meter‐long beamline will share the straight section with a future tomography beamline by using canted undulators having 6.5‐mrad separation angle. The optical design of Nanoscopium aims to reduce the effect of instabilities on the probing nanobeam by utilizing an all‐horizontal geometry for the reflections of the primary beamline mirrors, which focus onto a slit, creating an over‐filled secondary source. Kirkpatrick‐Baez mirrors and Fresnel zone plates will be used as focusing devices in the experiment hutches. Nanoscopium is expected to commence user operation in 2013.

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78.20.Ci	Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)
42.30.Wb	Image reconstruction; tomography
42.79.Ci	Filters, zone plates, and polarizers
78.70.En	X-ray emission spectra and fluorescence
61.05.cp	X-ray diffraction

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Laboratory 3D Micro‐XRF∕Micro‐CT Imaging System

P. Bruyndonckx, A. Sasov, and X. Liu

AIP Conf. Proc. 1365, pp. 61-64; doi:http://dx.doi.org/10.1063/1.3625304 (4 pages)

Online Publication Date: 16 September 2011

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A prototype micro‐XRF laboratory system based on pinhole imaging was developed to produce 3D elemental maps. The fluorescence x‐rays are detected by a deep‐depleted CCD camera operating in photon‐counting mode. A charge‐clustering algorithm, together with dynamically adjusted exposure times, ensures a correct energy measurement. The XRF component has a spatial resolution of 70 μm and an energy resolution of 180 eV at 6.4 keV. The system is augmented by a micro‐CT imaging modality. This is used for attenuation correction of the XRF images and to co‐register features in the 3D XRF images with morphological structures visible in the volumetric CT images of the object.

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78.70.En	X-ray emission spectra and fluorescence
42.50.Ar	Photon statistics and coherence theory
42.30.Wb	Image reconstruction; tomography
42.30.Sy	Pattern recognition

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Developments in the Fabrication of Zone Plates and Other Nanostructures

P. Charalambous

AIP Conf. Proc. 1365, pp. 65-68; doi:http://dx.doi.org/10.1063/1.3625305 (4 pages)

Online Publication Date: 16 September 2011

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We have been involved in all aspects of nanofabrication for many years. This includes zone plates, calibration test objects, gratings, Young’s slits, and nanohole arrays, both ordered and random. Most of our nanostructures are fabricated in tungsten, a material very well suited for a very wide range of x‐ray energies, with the added advantage that it is the closest thermally matched material to the usual Si₃N₄ substrate. Alternative materials are used when there is clear advantage; for example, we can fabricate optics for EUV operation in both molybdenum and niobium, which give superior diffraction efficiencies to other metals at ∼13 nm. Through continuous optimization, we are now in a position to deposit stable tungsten films up to 3 μm thick, and successfully fabricated zone plates and calibration samples in 3‐μm‐thick tungsten, suitable for operation up to 40 keV.

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42.79.Ci	Filters, zone plates, and polarizers
61.05.cp	X-ray diffraction
65.40.De	Thermal expansion; thermomechanical effects
42.82.Cr	Fabrication techniques; lithography, pattern transfer

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Multilayer Laue Lens Growth at NSLS‐II

R. Conley, N. Bouet, K. Lauer, M. Carlucci‐Dayton, J. Biancarosa, L. Boas, J. Drannbauer, J. Feraca, and L. Rosenbaum

AIP Conf. Proc. 1365, pp. 69-72; doi:http://dx.doi.org/10.1063/1.3625306 (4 pages)

Online Publication Date: 16 September 2011

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The new NSLS‐II deposition laboratory has been commissioned to include a variety of thin‐film characterization equipment and a next‐generation deposition system [1]. The primary goal for this effort is R&D on the multilayer Laue lens (MLL) [2–4], which is a new type of x‐ray optic with the potential for an unprecedented level of x‐ray nano‐focusing. This unique deposition system contains many design features in order to facilitate growth of combined depth‐graded and laterally graded multilayers with precise thickness control over many thousands of layers, providing total film growth in one run of up to 100 μm thick or greater. A precision in‐vacuum linear motor servo system raster scans a substrate over an array of magnetrons with shaped apertures at well‐defined velocities to affect a multilayer coating. The design, commissioning, and performance metrics of the NSLS‐II deposition system will be discussed. Latest growth results of both MLL and reflective multilayers in this machine will be presented.

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68.55.jd	Thickness
42.25.Gy	Edge and boundary effects; reflection and refraction
42.82.Cr	Fabrication techniques; lithography, pattern transfer
68.37.Hk	Scanning electron microscopy (SEM) (including EBIC)
68.55.at	Other materials

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Large‐Area Zone Plate Fabrication with Optical Lithography

G. Denbeaux

AIP Conf. Proc. 1365, pp. 73-76; doi:http://dx.doi.org/10.1063/1.3625307 (4 pages)

Online Publication Date: 16 September 2011

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Zone plates as condenser optics for x‐ray microscopes offer simple optical designs for both illumination and spectral resolution when used as a linear monochromator. However, due to the long write times for electron beam lithography, both the availability and the size of zone plates for condensers have been limited. Since the resolution provided by the linear monochromator scales almost linearly with the diameter of the zone plate, the full potential for zone plate monochromators as illumination systems for x‐ray microscopes has not been achieved. For example, the 10‐mm‐diameter zone plate has demonstrated a spectral resolution of E/ΔE = 700 [1], but with a 26‐mm‐diameter zone plate, the calculated spectral resolution is higher than E/ΔE = 3000. These large‐area zone plates are possible to fabricate with the leading edge semiconductor lithography tools such as those available at the College of Nanoscale Science and Engineering at the University at Albany. One of the lithography tools available is the ASML TWINSCAN XT: 1950i with 37‐nm resolution [2]. A single 300‐mm wafer can contain more than 60 fields, each with a large area condenser, and the throughput of the tool can be more than one wafer every minute.

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42.79.Ci	Filters, zone plates, and polarizers
07.85.Tt	X-ray microscopes
41.85.Si	Particle beam collimators, monochromators
42.82.Cr	Fabrication techniques; lithography, pattern transfer
42.79.Dj	Gratings

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Performance of Multilayer Monochromators for Hard X‐Ray Imaging with Coherent Synchrotron Radiation

R. Dietsch, A. Rack, T. Weitkamp, M. Riotte, T. Rack, T. Holz, M. Krämer, D. Weissbach, Ch. Morawe, F. Siewert, M. Meduňa, P. Cloetens, and E. Ziegler

AIP Conf. Proc. 1365, pp. 77-80; doi:http://dx.doi.org/10.1063/1.3625308 (4 pages)

Online Publication Date: 16 September 2011

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We present a study in which multilayers of different periodicity (from 2.5 to 5.5 nm), composition (W∕Si, Mo∕Si, Pd/B₄C, Ru/B₄C), and numbers of layers have been compared. Particularly, we chose mirrors with similar intrinsic quality (roughness and reflectivity) to study their performance (flatness and coherence of the outgoing beam) as monochromators in synchrotron radiography. The results indicate that material composition is the dominating factor for the performance. This is important to consider for future developments in synchrotron‐based hard x‐ray imaging methods. In these techniques, multilayer monochromators are popular because of their good tradeoff between spectral bandwidth and photon flux density of the outgoing beam, but sufficient homogeneity and preservation of the coherent properties of the reflected beam are major concerns. The experimental results we collected may help scientists and engineers specify multilayer monochromators and can contribute to better exploitation of the advantages of multilayer monochromators in microtomography and other full‐field imaging techniques.

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41.85.Si	Particle beam collimators, monochromators
78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
42.30.Wb	Image reconstruction; tomography
87.59.bf	Digital radiography
42.82.Cr	Fabrication techniques; lithography, pattern transfer

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Source Size Characterization of a Microfocus X‐ray Tube Used for In‐Line Phase‐Contrast Imaging

J. Ewald and T. Wilhein

AIP Conf. Proc. 1365, pp. 81-83; doi:http://dx.doi.org/10.1063/1.3625309 (3 pages)

Online Publication Date: 16 September 2011

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We describe a high‐resolution point‐projection x‐ray imaging system using in‐line phase contrast to image weakly absorbing specimens. By employing a microfocus x‐ray tube, features down to 3 μm and less can be resolved using both phase‐ and absorption contrast. A front‐illuminated deep‐depleted CCD with Be‐window was used as an imaging sensor for 8‐keV radiation emitted from the Cu transmission target in the x‐ray tube. Exposure times ranging from a few minutes down to ten seconds were possible depending on the specimen characteristics and target power. Periodic gold gratings on a custom‐made resolution object were used to evaluate the x‐ray source size at the target plane, which directly affects the overall resolution of the system. By comparing horizontal and vertical lines in one image, source size variations in two directions could be recorded in the same image. Furthermore, samples including other resolution targets, plastic structures, and various insects were imaged with up to 80× magnification.

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42.79.Dj	Gratings
42.79.Ci	Filters, zone plates, and polarizers
42.25.Fx	Diffraction and scattering
42.30.Wb	Image reconstruction; tomography

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Germanium‐Based Circular Zone Plates for Soft and Hard X‐Rays

A. Firsov, R. Belkhou, M. Idir, A. Svintsov, S. Zaitsev, L. Ferlazzo, and E. Cambril

AIP Conf. Proc. 1365, pp. 84-87; doi:http://dx.doi.org/10.1063/1.3625310 (4 pages)

Online Publication Date: 16 September 2011

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Development of a technological basis for the fabrication of diffraction optical elements has been underway at Synchrotron SOLEIL since April 2009. These diffraction focusing elements are: zone plates and condenser lenses for soft x‐rays (80–2500 eV), focusing zone plates for hard x‐rays (4–24 keV), and diffraction elements working under complete external reflection conditions with elliptical diffraction zones and a topology appropriate to operate at a glancing incidence to fulfill the conditions of total external reflection (energy range 100–1500 eV). This work discusses fabrication of circular germanium‐based zone plates and results of numerical calculations of the behavior of zone plates with real topologies under real experimental conditions. The software used for these calculations allows us to take into account the undercut of zones that occurs after plasmachemical etching as well as variations in the zone heights. Such variations could be used to correct or improve zone plate efficiency after electroplating or plasmachemical etching and can be performed by a focused ion beam etching [1] (direct or with active gas assistance). Data preparation and ion beam control for these corrections can be carried out by Nanomaker software (Interface Ltd).

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42.79.Ci	Filters, zone plates, and polarizers
42.25.Fx	Diffraction and scattering
42.25.Gy	Edge and boundary effects; reflection and refraction
02.40.Pc	General topology
42.82.Cr	Fabrication techniques; lithography, pattern transfer

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High‐Efficiency Gold Fresnel Zone Plates for Multi‐keV X‐rays

S. Gorelick, J. Vila‐Comamala, V. A. Guzenko, R. Barrett, M. Salomé, and C. David

AIP Conf. Proc. 1365, pp. 88-91; doi:http://dx.doi.org/10.1063/1.3625311 (4 pages)

Online Publication Date: 16 September 2011

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We report a direct e‐beam writing process of Fresnel zone plates (FZPs) using thick layers of PMMA resist as electroplating molds. We used 100‐kV electron beam lithography to directly expose thick PMMA layers, which were later used as plating molds without intermediate etching steps. High‐quality 500‐nm‐ and 1‐μm‐thick Au FZPs with outermost zone widths down to 50‐nm and 70‐nm, respectively, and with diameters up to 600 μm were fabricated. In this paper we present the details of the optimized fabrication process, such as development times, developer, dose tables, and line shrinkages required to obtain the desired zone widths and gaps between the zones. The diffraction efficiencies of the fabricated FZPs were measured for a wide range of x‐ray energies (2.8–13.2 keV) showing excellent values up to 65–75% of the theoretical maximum, reflecting the good quality of the FZPs. Spatially resolved diffraction efficiency measurements indicate the uniformity of the zone plates and lack of defects.

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42.79.Ci	Filters, zone plates, and polarizers
42.25.Gy	Edge and boundary effects; reflection and refraction
02.60.Pn	Numerical optimization
81.15.Pq	Electrodeposition, electroplating

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Efficient E‐Beam Lithography Exposure Strategies for Diffractive X‐ray Optics

V. A. Guzenko, J. Romijn, J. Vila‐Comamala, S. Gorelick, and C. David

AIP Conf. Proc. 1365, pp. 92-95; doi:http://dx.doi.org/10.1063/1.3625312 (4 pages)

Online Publication Date: 16 September 2011

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Exposure of structures with rotational symmetry by means of electron beam lithography is not trivial, because the e‐beam writers are usually designed to deal with the data defined in Cartesian coordinates. Fabrication of circular nanostructures like Fresnel zone plates (FZPs) for x‐ray microscopy applications requires exposures with resolution well below 1 nm. Therefore, special attention has to be paid to the efficient exposure data preparation, which will guarantee required precision and allow keeping the exposure time low. In this article, we describe in detail an optimized strategy that was applied for exposure of FZPs by the Vistec EBPG5000Plus e‐beam lithography tool. Direct programming of exposure files allowed us to use fully the capabilities of this e‐beam writer to expose efficiently and reproducibly FZPs with desired characteristics in both positive and negative tone resists.

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42.82.Cr	Fabrication techniques; lithography, pattern transfer
68.37.Yz	X-ray microscopy
02.60.Pn	Numerical optimization
07.05.Hd	Data acquisition: hardware and software
41.50.+h	X-ray beams and x-ray optics

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The Göttingen Holography Endstation of Beamline P10 at PETRA III∕DESY

S. Kalbfleisch, H. Neubauer, S. P. Krüger, M. Bartels, M. Osterhoff, D. D. Mai, K. Giewekemeyer, B. Hartmann, M. Sprung, and T. Salditt

AIP Conf. Proc. 1365, pp. 96-99; doi:http://dx.doi.org/10.1063/1.3625313 (4 pages) | Cited 1 time

Online Publication Date: 16 September 2011

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We report the commissioning of the novel holography endstation for the P10 coherence beamline at PETRA III at DESY. The experimental imaging scheme is based on a highly coherent and divergent (cone) beam illumination, achieved by fixed‐curvature focusing mirrors with additional spatial and coherence filtering by x‐ray waveguides. The optical elements along the beam path and the instrument in commissioning are described. First experimental results are shown.

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42.40.Lx	Diffraction efficiency, resolution, and other hologram characteristics
42.40.Eq	Holographic optical elements; holographic gratings
42.82.Et	Waveguides, couplers, and arrays
61.05.cp	X-ray diffraction

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Development of Multilayer Laue Lenses; (2) Circular Type

T. Koyama, T. Tsuji, H. Takano, Y. Kagoshima, S. Ichimaru, T. Ohchi, and H. Takenaka

AIP Conf. Proc. 1365, pp. 100-103; doi:http://dx.doi.org/10.1063/1.3625314 (4 pages)

Online Publication Date: 16 September 2011

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A circular type multilayer Laue lens (MLL) has been designed and fabricated. A graded‐thickness multilayer was deposited on a tapered wire core by using a magnetron sputtering system. A combination of MoSi₂ and Si was chosen as the multilayer materials owing to its superior properties of high diffraction efficiency and relatively sharp interfaces between layers. Optical properties of the circular type MLL were measured at BL24XU of SPring‐8 with 20‐keV x‐rays. It was confirmed that only the +first‐order diffraction was focused in the focal point owing to the wedged zone structure. Measured +first‐order diffraction efficiency of the multilayer part was as high as 52%. Applying the circular type MLL to scanning transmission microscopy, a 50‐nm line and space of a test chart was resolved.

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78.67.Pt	Multilayers; superlattices; photonic structures; metamaterials
42.25.Fx	Diffraction and scattering
42.79.Ag	Apertures, collimators
42.30.Wb	Image reconstruction; tomography

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Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach

J. Lenz, N. Krupp, T. Wilhein, and S. Irsen

AIP Conf. Proc. 1365, pp. 104-107; doi:http://dx.doi.org/10.1063/1.3625315 (4 pages)

Online Publication Date: 16 September 2011

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Diffractive optical elements are important components for applications in soft x‐ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. This requires a series of complex processes including exposure, reactive ion‐etching, and electro‐plating. We report on experiments showing the single‐step fabrication of such elements using ion beam lithography. Both transmission and reflection gratings were fabricated and successfully implemented as spectrometers at laboratory soft x‐ray sources. Additionally, first steps toward zone plate fabrication are described.

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42.25.Fx	Diffraction and scattering
41.50.+h	X-ray beams and x-ray optics
42.79.Dj	Gratings
07.85.Nc	X-ray and γ-ray spectrometers

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X‐ray Laue Diffraction Microscopy in 3D at the Advanced Photon Source

W. Liu, P. Zschack, J. Tischler, G. Ice, and B. Larson

AIP Conf. Proc. 1365, pp. 108-111; doi:http://dx.doi.org/10.1063/1.3625316 (4 pages)

Online Publication Date: 16 September 2011

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Studies of materials on mesoscopic length‐scales require a penetrating structural probe with submicron point‐to‐point spatial resolution. The principle research activities at beamline 34‐ID‐E of the Advanced Photon Source (APS) involve development of exciting new micro‐∕nano‐diffraction techniques for characterization and microscopy in support of both applied engineering and fundamental materials research. Taking advantage of the high brightness of the source, advanced focusing mirrors, a novel depth profiling technique, and high‐speed area detectors, three‐dimensional scanning Laue diffraction microscopy provides detailed local structural information of crystalline materials, such as crystallographic orientation, orientation gradients, and strain tensors. It is general and applicable to single‐crystal, polycrystalline, composite, deformed, and functionally graded materials. Applications include 3D diffraction investigations for a diverse and growing user community with interests in materials deformation, electro‐migration, recrystallization, fatigue, solid‐solution precipitation, high‐pressure environments, and condensed matter physics.

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78.67.Bf	Nanocrystals, nanoparticles, and nanoclusters
81.10.Aj	Theory and models of crystal growth; physics and chemistry of crystal growth, crystal morphology, and orientation
66.30.Qa	Electromigration
81.10.Jt	Growth from solid phases (including multiphase diffusion and recrystallization)
81.10.Dn	Growth from solutions
81.10.Fq	Growth from melts; zone melting and refining
81.15.Lm	Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)

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Hard X‐ray Zone Plates Using Ultrananocrystalline Diamond Molds

M. J. Wojcik, V. Joshi, A. V. Sumant, R. Divan, L. E. Ocola, M. Lu, and D. C. Mancini

AIP Conf. Proc. 1365, pp. 112-115; doi:http://dx.doi.org/10.1063/1.3625317 (4 pages)

Online Publication Date: 16 September 2011

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While hard x‐ray zone plates have made great advances recently towards improved resolution, their focusing efficiency requires further development. This problem becomes more important as higher‐energy x‐rays are used for x‐ray microscopy. The current method for fabricating zone plates involves a dielectric mold, which is then electroplated into, but the materials used for this mold are not mechanically stiff enough for the zone plates desired. Ultrananocrystalline diamond (UNCD) is a form of diamond that can be grown as a thin film by chemical vapor deposition and offers many of the physical properties of bulk diamond. Its mechanical stiffness, resistance to radiation damage, dielectric properties, and ability to be etched suggests UNCD as a capable mold material. Reported is progress in the fabrication of hard x‐ray zone plates with gold electroformed into a UNCD mold.

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68.37.Yz	X-ray microscopy
81.15.Gh	Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
81.15.Pq	Electrodeposition, electroplating
85.40.Hp	Lithography, masks and pattern transfer

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